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Surface donor states distribution post SiN passivation of AlGaN/GaN heterostructures

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.4891499· OSTI ID:22311170
 [1];  [2]
  1. Carinthian Tech Research CTR AG, Europastraße 4/1, Technologiepark Villach, A- 9524 Villach/St. Magdalen (Austria)
  2. Department of Electronics and Telecommunication, Norwegian University of Science and Technology, Trondheim NO7034 (Norway)

In this paper, we present a physics based analytical model to describe the effect of SiN passivation on two-dimensional electron gas density and surface barrier height in AlGaN/GaN heterostructures. The model is based on an extraction technique to calculate surface donor density and surface donor level at the SiN/AlGaN interface. The model is in good agreement with the experimental results and promises to become a useful tool in advanced design and characterization of GaN based heterostructures.

OSTI ID:
22311170
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 3 Vol. 105; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English