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Title: Amorphous FeCoSiB for exchange bias coupled and decoupled magnetoelectric multilayer systems: Real-structure and magnetic properties

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4896662· OSTI ID:22305763
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  1. Inorganic Functional Materials, Institute for Materials Science CAU Kiel, Kaiserstr. 2, 24143 Kiel (Germany)
  2. Synthesis and Real Structure, Institute for Materials Science CAU Kiel, Kaiserstr. 2, 24143 Kiel (Germany)
  3. Nanoscale Magnetic Materials, Institute for Materials Science CAU Kiel, Kaiserstr. 2, 24143 Kiel (Germany)

The effect of field annealing for exchanged biased multilayer films is studied with respect to the resultant structural and magnetic film properties. The presented multilayer stacks comprise repeating sequences of Ta/Cu/(1 1 1) textured antiferromagnetic Mn₇₀Ir₃₀ /amorphous ferromagnetic Fe₇₀.₂Co₇.₈Si₂B₁₀. Within the ferromagnetic layers crystalline filaments are observed. An additional Ta layer between the antiferromagnet and ferromagnet is used in order to investigate and separate the influence of the common Mn₇₀Ir₃₀/Fe₇₀.₂Co₇.₈Si₁₂B₁₀ interface on the occurring filaments and structural changes. In situ and ex situ transmission electron microscopy is used for a comprehensive structure characterization of multilayer stacks for selected temperature stages. Up to 250 °C, the multilayers are structurally unaltered and preserve the as-deposited condition. A deliberate increase to 350 °C exhibits different crystallization processes for the films, depending on the presence of crystal nuclei within the amorphous ferromagnetic layer. The influence of volume-to-surface ratio of the multilayer stacks to the crystallization process is emphasized by the comparison of in situ and ex situ investigations as the respective specimen thickness is changed. Complementary magnetic studies reveal a defined exchange bias obtained at the first annealing step and a decrease of total anisotropy field with partial crystallization after the subsequent annealing at 350 °C.

OSTI ID:
22305763
Journal Information:
Journal of Applied Physics, Vol. 116, Issue 13; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Publisher:
American Institute of Physics (AIP)
Country of Publication:
United States
Language:
English