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Title: Absolute CF{sub 2} density and gas temperature measurements by absorption spectroscopy in dual-frequency capacitively coupled CF{sub 4}/Ar plasmas

Journal Article · · Physics of Plasmas
DOI:https://doi.org/10.1063/1.4897172· OSTI ID:22299713
; ; ; ; ;  [1]; ;  [1]
  1. Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024 (China)

Broadband ultraviolet absorption spectroscopy has been used to determine the CF{sub 2} radical density in dual-frequency capacitively coupled CF{sub 4}/Ar plasmas, using the CF{sub 2} A{sup ~1}B{sub 1}←X{sup ~1}A{sub 1} system of absorption spectrum. The rotational temperature of ground state CF{sub 2} and excited state CF was also estimated by using A{sup ~1}B{sub 1}←X{sup ~1}A{sub 1} system and B{sup 2}Δ−X{sup 2}Π system, respectively. The translational gas temperature was deduced from the Doppler width of the Ar{sup *}({sup 3}P{sub 2}) and Ar{sup *}({sup 3}P{sub 0}) metastable atoms absorption line by using the tunable diode laser absorption spectroscopy. The rotational temperatures of the excited state CF are about 100 K higher than those of ground state CF{sub 2}, and about 200 K higher than the translational gas temperatures. The dependences of the radical CF{sub 2} density, electron density, electron temperature, rotational temperature, and gas temperature on the high frequency power and pressure have been analyzed. Furthermore, the production and loss mechanisms of CF{sub 2} radical and the gas heating mechanisms have also been discussed.

OSTI ID:
22299713
Journal Information:
Physics of Plasmas, Vol. 21, Issue 10; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 1070-664X
Country of Publication:
United States
Language:
English

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