Epitaxial c-axis oriented BaTiO{sub 3} thin films on SrTiO{sub 3}-buffered Si(001) by atomic layer deposition

Ngo, Thong Q.; McDaniel, Martin D.; Posadas, Agham B.; Demkov, Alexander A.; Hu, Chengqing; Yu, Edward T.; Bruley, John

doi:10.1063/1.4867469

Epitaxial c-axis oriented BaTiO{sub 3} thin films on SrTiO{sub 3}-buffered Si(001) by atomic layer deposition

Journal Article · Mon Feb 24 04:00:00 EST 2014 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4867469· OSTI ID:22293116

Ngo, Thong Q.; McDaniel, Martin D.; Posadas, Agham B.; Demkov, Alexander A. ^[1]; Hu, Chengqing; Yu, Edward T. ^[2]; Bruley, John ^[3]

Department of Physics, The University of Texas at Austin, Austin, Texas 78712 (United States)
Department of Electrical Engineering, The University of Texas at Austin, Austin, Texas 78712 (United States)
IBM Research Division, Yorktown Heights, New York 10593 (United States)

Atomic layer deposition (ALD) of epitaxial c-axis oriented BaTiO{sub 3} (BTO) on Si(001) using a thin (1.6 nm) buffer layer of SrTiO{sub 3} (STO) grown by molecular beam epitaxy is reported. The ALD growth of crystalline BTO films at 225 °C used barium bis(triisopropylcyclopentadienyl), titanium tetraisopropoxide, and water as co-reactants. X-ray diffraction (XRD) reveals a high degree of crystallinity and c-axis orientation of as-deposited BTO films. Crystallinity is improved after vacuum annealing at 600 °C. Two-dimensional XRD confirms the tetragonal structure and orientation of 7–20-nm thick films. The effect of the annealing process on the BTO structure is discussed. A clean STO/Si interface is found using in-situ X-ray photoelectron spectroscopy and confirmed by cross-sectional scanning transmission electron microscopy. The capacitance-voltage characteristics of 7–20 nm-thick BTO films are examined and show an effective dielectric constant of ∼660 for the heterostructure.

OSTI ID:: 22293116

Journal Information:: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 8 Vol. 104; ISSN APPLAB; ISSN 0003-6951

Country of Publication:: United States

Language:: English

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75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANNEALING
BARIUM COMPOUNDS
CAPACITANCE
CRYSTAL GROWTH
DEPOSITION
ELECTRIC POTENTIAL
MOLECULAR BEAM EPITAXY
PERMITTIVITY
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TRANSMISSION ELECTRON MICROSCOPY
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X-RAY DIFFRACTION
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Epitaxial c-axis oriented BaTiO{sub 3} thin films on SrTiO{sub 3}-buffered Si(001) by atomic layer deposition

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