Epitaxial c-axis oriented BaTiO{sub 3} thin films on SrTiO{sub 3}-buffered Si(001) by atomic layer deposition
- Department of Physics, The University of Texas at Austin, Austin, Texas 78712 (United States)
- Department of Electrical Engineering, The University of Texas at Austin, Austin, Texas 78712 (United States)
- IBM Research Division, Yorktown Heights, New York 10593 (United States)
Atomic layer deposition (ALD) of epitaxial c-axis oriented BaTiO{sub 3} (BTO) on Si(001) using a thin (1.6 nm) buffer layer of SrTiO{sub 3} (STO) grown by molecular beam epitaxy is reported. The ALD growth of crystalline BTO films at 225 °C used barium bis(triisopropylcyclopentadienyl), titanium tetraisopropoxide, and water as co-reactants. X-ray diffraction (XRD) reveals a high degree of crystallinity and c-axis orientation of as-deposited BTO films. Crystallinity is improved after vacuum annealing at 600 °C. Two-dimensional XRD confirms the tetragonal structure and orientation of 7–20-nm thick films. The effect of the annealing process on the BTO structure is discussed. A clean STO/Si interface is found using in-situ X-ray photoelectron spectroscopy and confirmed by cross-sectional scanning transmission electron microscopy. The capacitance-voltage characteristics of 7–20 nm-thick BTO films are examined and show an effective dielectric constant of ∼660 for the heterostructure.
- OSTI ID:
- 22293116
- Journal Information:
- Applied Physics Letters, Vol. 104, Issue 8; Other Information: (c) 2014 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANNEALING
BARIUM COMPOUNDS
CAPACITANCE
CRYSTAL GROWTH
DEPOSITION
ELECTRIC POTENTIAL
MOLECULAR BEAM EPITAXY
PERMITTIVITY
STRONTIUM TITANATES
THIN FILMS
TRANSMISSION ELECTRON MICROSCOPY
TWO-DIMENSIONAL CALCULATIONS
WATER
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY