Characteristics of ITO films with oxygen plasma treatment for thin film solar cell applications

Journal Article · Sun Dec 15 04:00:00 EST 2013 · Materials Research Bulletin

DOI:https://doi.org/10.1016/J.MATERRESBULL.2013.07.026· OSTI ID:22290364

Park, Yong Seob ^[1]; Kim, Eungkwon ^[2]; Hong, Byungyou ^[3]; Lee, Jaehyoeng ^[3]

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1. Department of Photoelectronics Information, Chosun College of Science and Technology, Gwangju (Korea, Republic of)
2. Digital Broadcasting Examination, Korean Intellectual Property Office, Daejeon, Suwon 440-746 (Korea, Republic of)
3. School of Electronic and Electrical Engineering, Sungkyunkwan University, Cheoncheon-dong, 300, Jangan-gu, Suwon 440-746 (Korea, Republic of)

Graphical abstract: The effect of O{sub 2} plasma treatment on the surface and the work function of ITO films. - Highlights: • ITO films were prepared on the glass substrate by RF magnetron sputtering method. • Effects of O{sub 2} plasma treatment on the properties of ITO films were investigated. • The work function of ITO film was changed from 4.67 to 5.66 eV by plasma treatment. - Abstract: The influence of oxygen plasma treatment on the electro-optical and structural properties of indium-tin-oxide films deposited by radio frequency magnetron sputtering method were investigated. The films were exposed at different O{sub 2} plasma powers and for various durations by using the plasma enhanced chemical vapor deposition (PECVD) system. The resistivity of the ITO films was almost constant, regardless of the plasma treatment conditions. Although the optical transmittance of ITO films was little changed by the plasma power, the prolonged treatment slightly increased the transmittance. The work function of ITO film was changed from 4.67 eV to 5.66 eV at the plasma treatment conditions of 300 W and 60 min.

• OSTI ID: 22290364
• Journal Information: Materials Research Bulletin, Journal Name: Materials Research Bulletin Journal Issue: 12 Vol. 48; ISSN MRBUAC; ISSN 0025-5408
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CHEMICAL VAPOR DEPOSITION
GLASS
INDIUM
MAGNETRONS
OXYGEN
RADIOWAVE RADIATION
SOLAR CELLS
SPUTTERING
SUBSTRATES
THIN FILMS
TIN OXIDES
WORK FUNCTIONS