Non-equilibrium deposition of phase pure Cu{sub 2}O thin films at reduced growth temperature

Journal Article · Sat Feb 01 04:00:00 EST 2014 · APL Materials

DOI:https://doi.org/10.1063/1.4865457· OSTI ID:22269558

Subramaniyan, Archana ^[1]; Perkins, John D.; Lany, Stephan; Stevanovic, Vladan; Ginley, David S.; Zakutayev, Andriy ^[1]; O’Hayre, Ryan P. ^[2]

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1. National Renewable Energy Laboratory, Golden, Colorado 80401 (United States)
2. Department of Metallurgical and Materials Engineering, Colorado School of Mines, Golden, Colorado 80401 (United States)

Cuprous oxide (Cu{sub 2}O) is actively studied as a prototypical material for energy conversion and electronic applications. Here we reduce the growth temperature of phase pure Cu{sub 2}O thin films to 300 °C by intentionally controlling solely the kinetic parameter (total chamber pressure, P{sub tot}) at fixed thermodynamic condition (0.25 mTorr pO{sub 2}). A strong non-monotonic effect of P{sub tot} on Cu-O phase formation is found using high-throughput combinatorial-pulsed laser deposition. This discovery creates new opportunities for the growth of Cu{sub 2}O devices with low thermal budget and illustrates the importance of kinetic effects for the synthesis of metastable materials with useful properties.

• OSTI ID: 22269558
• Journal Information: APL Materials, Journal Name: APL Materials Journal Issue: 2 Vol. 2; ISSN AMPADS; ISSN 2166-532X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
COPPER OXIDES
ENERGY BEAM DEPOSITION
ENERGY CONVERSION
LASER RADIATION
PULSED IRRADIATION
SYNTHESIS
THIN FILMS