Cerium reduction at the interface between ceria and yttria-stabilised zirconia and implications for interfacial oxygen non-stoichiometry

Journal Article · Sat Mar 01 04:00:00 EST 2014 · APL Materials

DOI:https://doi.org/10.1063/1.4867556· OSTI ID:22269550

Song, Kepeng ^[1]; Schmid, Herbert ^[2]; Srot, Vesna; Aken, Peter A. van, ^[1]; Gilardi, Elisa; Gregori, Giuliano; Maier, Joachim ^[3]; Du, Kui ^[4]

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1. Stuttgart Center for Electron Microscopy, Max Planck Institute for Intelligent Systems, Heisenbergstraße 3, 70569 Stuttgart (Germany)
2. INM-Leibniz Institute for New Materials, Campus D2 2, D-66123 Saarbrücken (Germany)
3. Max Planck Institute for Solid State Research, Heisenbergstraße 1, 70569 Stuttgart (Germany)
4. Shenyang National Laboratory for Materials Science, Institute of Metal Research, Chinese Academy of Sciences, Wenhua Road 72, 110016 Shenyang (China)

Epitaxial CeO{sub 2} films with different thickness were grown on Y{sub 2}O{sub 3} stabilised Zirconia substrates. Reduction of cerium ions at the interface between CeO{sub 2} films and yttria stabilised zirconia substrates is demonstrated using aberration-corrected scanning transmission electron microscopy combined with electron energy-loss spectroscopy. It is revealed that most of the Ce ions were reduced from Ce{sup 4+} to Ce{sup 3+} at the interface region with a decay of several nanometers. Several possibilities of charge compensations are discussed. Irrespective of the details, such local non-stoichiometries are crucial not only for understanding charge transport in such hetero-structures but also for understanding ceria catalytic properties.

• OSTI ID: 22269550
• Journal Information: APL Materials, Journal Name: APL Materials Journal Issue: 3 Vol. 2; ISSN AMPADS; ISSN 2166-532X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
CERIUM
CERIUM IONS
CERIUM OXIDES
ENERGY-LOSS SPECTROSCOPY
EPITAXY
FILMS
INTERFACES
OXYGEN
REDUCTION
SUBSTRATES
TRANSMISSION ELECTRON MICROSCOPY
YTTRIUM OXIDES
ZIRCONIUM OXIDES