Plasma reactivity in high-power impulse magnetron sputtering through oxygen kinetics

Journal Article · Mon Sep 02 00:00:00 EDT 2013 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4819835· OSTI ID:22217927

Vitelaru, Catalin ^[1]; Lundin, Daniel ^[1]; Brenning, Nils ^[2]; Minea, Tiberiu ^[1]

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1. Laboratoire the Physique de Gaz et Plasmas, UMR 8578 CNRS, Université Paris-Sud, Orsay Cedex 91405 (France)
2. Division of Space and Plasma Physics, School of Electrical Engineering, Royal Institute of Technology, Stockholm, SE-100 44 (Sweden)

The atomic oxygen metastable dynamics in a Reactive High-Power Impulse Magnetron Sputtering (R-HiPIMS) discharge has been characterized using time-resolved diode laser absorption in an Ar/O{sub 2} gas mixture with a Ti target. Two plasma regions are identified: the ionization region (IR) close to the target and further out the diffusion region (DR), separated by a transition region. The μs temporal resolution allows identifying the main atomic oxygen production and destruction routes, which are found to be very different during the pulse as compared to the afterglow as deduced from their evolution in space and time.

• OSTI ID: 22217927
• Journal Information: Applied Physics Letters, Vol. 103, Issue 10; Other Information: (c) 2013 AIP Publishing LLC; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

71 CLASSICAL AND QUANTUM MECHANICS
GENERAL PHYSICS
ABSORPTION
AFTERGLOW
ARGON
DEPOSITION
ELECTRIC DISCHARGES
EVOLUTION
MAGNETRONS
METASTABLE STATES
MIXTURES
OXYGEN
PLASMA DIAGNOSTICS
PULSES
REACTION KINETICS
SEMICONDUCTOR LASERS
SPUTTERING
TIME RESOLUTION
TITANIUM ALLOYS