Preparation of carbonitride films in the active and afterglow phases of a glow discharge

Journal Article · Wed May 15 04:00:00 EDT 2013 · Plasma Physics Reports

DOI:https://doi.org/10.1134/S1063780X1305005X· OSTI ID:22126523

Grigorian, G. M. ^[1]; Kochetov, I. V. ^[2]

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1. St. Petersburg State University (Russian Federation)
2. Troitsk Institute for Innovation and Fusion Research (Russian Federation)

The formation of carbonitride (C{sub x}N{sub y}) films in the active and afterglow phases of a glow discharge in CH{sub 4}-N{sub 2} mixtures (as well in these mixtures diluted with argon and helium) was studied experimentally. The dependences of the film growth rate on the discharge current and gas pressure are obtained. The composition (the N/C ratio) and IR absorption spectra of the films are determined. Measurements of the absorption spectra made it possible to identify bonds between C and N atoms. A novel method of carbonitride film deposition in the 'double afterglow' mode was proposed. The use of this method appreciably increases the film deposition rate. Possible mechanisms of the formation and destruction of carbonitride films in the active and afterglow phases of the discharge are discussed.

• OSTI ID: 22126523
• Journal Information: Plasma Physics Reports, Journal Name: Plasma Physics Reports Journal Issue: 5 Vol. 39; ISSN PPHREM; ISSN 1063-780X
• Country of Publication: United States
• Language: English

Related Subjects

70 PLASMA PHYSICS AND FUSION TECHNOLOGY
ABSORPTION SPECTRA
AFTERGLOW
ARGON
CARBON
CARBON NITRIDES
DEPOSITION
GLOW DISCHARGES
HELIUM
INFRARED RADIATION
METHANE
THIN FILMS