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Title: Fabrication and electrical transport properties of binary Co-Si nanostructures prepared by focused electron beam-induced deposition

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.4790320· OSTI ID:22102256
;  [1]; ;  [2]
  1. Physikalisches Institut, Goethe-Universitaet, Max-von-Laue-Str. 1, D-60438 Frankfurt am Main (Germany)
  2. Institut fr Anorganische und Analytische Chemie, Goethe-Universitaet, Max-von-Laue-Str. 7, D-60438 Frankfurt am Main (Germany)

CoSi-C binary alloys have been fabricated by focused electron beam-induced deposition by the simultaneous use of dicobaltoctacarbonyl, Co{sub 2}(CO){sub 8}, and neopentasilane, Si{sub 5}H{sub 12}, as precursor gases. By varying the relative flux of the precursors, alloys with variable chemical composition are obtained, as shown by energy dispersive x-ray analysis. Room temperature electrical resistivity measurements strongly indicate the formation of cobalt silicide and cobalt disilicide nanoclusters embedded in a carbonaceous matrix. Temperature-dependent electrical conductivity measurements show that the transport properties are governed by electron tunneling between neighboring CoSi or CoSi{sub 2} nanoclusters. In particular, by varying the metal content of the alloy, the electrical conductivity can be finely tuned from the insulating regime into the quasi-metallic tunneling coupling regime.

OSTI ID:
22102256
Journal Information:
Journal of Applied Physics, Vol. 113, Issue 5; Other Information: (c) 2013 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
Country of Publication:
United States
Language:
English