Growth and characterizations of semipolar (1122) InN
- Institute of Solid State Physics, Technische Universitaet Berlin, Hardenbergstrasse 36, 10623 Berlin (Germany)
- Institute of Physics, Polish Academy of Science, Al. Lotnikow 32/46, 02668 Warsaw (Poland)
We report on metal-organic vapor phase epitaxial growth of (1122) InN on (1122) GaN templates on m-plane (1010) sapphire substrates. The in-plane relationship of the (1122) InN samples is [1123]{sub InN} Double-Vertical-Line Double-Vertical-Line [0001]{sub sapphire} and [1100]{sub InN} Double-Vertical-Line Double-Vertical-Line [1210]{sub sapphire}, replicating the in-plane relationship of the (1122) GaN templates. The surface of the (1122) InN samples and the (1122) GaN templates shows an undulation along [1100]{sub InN,GaN}, which is attributed to anisotropic diffusion of indium/gallium atoms on the (1122) surfaces. The growth rate of the (1122) InN layers was 3-4 times lower compared to c-plane (0001) InN. High resolution transmission electron microscopy showed a relaxed interface between the (1122) InN layers and the (1122) GaN templates, consistent with x-ray diffraction results. Basal plane stacking faults were found in the (1122) GaN templates but they were terminated at the InN/(1122) GaN interface due to the presence of misfit dislocations along the entire InN/GaN interface. The misfit dislocations were contributed to the fully relaxation and the tilts of the (1122) InN layers. X-ray photoelectron spectroscopy was used to determine the polarity of the grown (1122) InN sample, indicating an In-polar (1122) InN. The valence band maximum was determined to be at (1.7 {+-} 0.1) eV for the (1122) InN sample, comparable to In-polar c-plane InN.
- OSTI ID:
- 22089296
- Journal Information:
- Journal of Applied Physics, Vol. 112, Issue 1; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
CHEMICAL VAPOR DEPOSITION
DIFFUSION
DISLOCATIONS
GALLIUM NITRIDES
INDIUM NITRIDES
INTERFACES
ORGANOMETALLIC COMPOUNDS
RELAXATION
RESOLUTION
SEMICONDUCTOR MATERIALS
STACKING FAULTS
SUBSTRATES
SURFACES
TRANSMISSION ELECTRON MICROSCOPY
VAPOR PHASE EPITAXY
X-RAY DIFFRACTION
X-RAY PHOTOELECTRON SPECTROSCOPY