skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Development of W/C soft x-ray multilayer mirror by ion beam sputtering (IBS) system for below 50A wavelength

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.4732374· OSTI ID:22068996
;  [1]
  1. Applied Spectroscopy Division, Bhabha Atomic Research Center, Mumbai 400 085 (India)

A home-made Ion Beam Sputtering (IBS) system has been developed in our laboratory. Using the IBS system single layer W and single layer C film has been deposited at 1000eV Ar ion energy and 10mA ion current. The W-film has been characterized by grazing Incidence X-ray reflectrometry (GIXR) technique and Atomic Force Microscope technique. The single layer C-film has been characterized by Spectroscopic Ellipsometric technique. At the same deposition condition 25-layer W/C multilayer film has been deposited which has been designed for using as mirror at 30 Degree-Sign grazing incidence angle around 50A wavelength. The multilayer sample has been characterized by measuring reflectivity of CuK{alpha} radiation and soft x-ray radiation around 50A wavelength.

OSTI ID:
22068996
Journal Information:
AIP Conference Proceedings, Vol. 1451, Issue 1; Conference: Indian Vacuum Society symposium on thin films, Mumbai (India), 9-12 Nov 2011; Other Information: (c) 2012 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English