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Modeling electric charge distribution on insulator under electron bombardment: Case of rectangular surface implantation

Journal Article · · AIP Advances
DOI:https://doi.org/10.1063/1.3700435· OSTI ID:22063934
;  [1];  [2]
  1. LaMaCop, Faculte des sciences de Sfax, Sfax, C.P 3038 (Tunisia)
  2. CEA, Direction des applications Militaires, Ba circumflex timent DAM, B.P. 12, 91680, Bruyeres-Le-Chatel (France)
Despite progress in the study of dielectric properties and the formation of secondary electrons images and especially in the understanding of their mirror curve shape, since the first models for mirror equation were developed, an exact quantitative prediction of the mirror curve for most materials has remained an unsolved problem. In this paper, recent development in the characterization of charge trapping ability of insulators using the scanning electron microscope mirror method (SEMMM) is reviewed. All this work has resulted in unprecedented insights into the early stage of dielectric study and it is also relevant for a deeper understanding of this anomalous effect (mirror effect) as well as for discussion of the factors affecting it. So the dependency of elliptic mirror and the anisotropic effect in the trapping phenomena of charge is highlighted.
OSTI ID:
22063934
Journal Information:
AIP Advances, Journal Name: AIP Advances Journal Issue: 1 Vol. 2; ISSN AAIDBI; ISSN 2158-3226
Country of Publication:
United States
Language:
English