Skip to main content
U.S. Department of Energy
Office of Scientific and Technical Information

The role of Mg interface layer in MgO magnetic tunnel junctions with CoFe and CoFeB electrodes

Journal Article · · AIP Advances
DOI:https://doi.org/10.1063/1.3690139· OSTI ID:22063925
 [1]; ;  [2]
  1. Department of Electrical and Computer Engineering, National University of Singapore, 4 Engineering Drive 3, Singapore 117576 (Singapore)
  2. IBM Almaden Research Center, 650 Harry Road, San Jose, California 95120 (United States)
The tunneling spin polarization (TSP) is directly measured from reactively sputter deposited crystalline MgO tunnel barriers with various CoFe(B) compositions using superconducting tunneling spectroscopy. We find that the Mg interface layer thickness dependence of TSP values for CoFeB/Mg/MgO junctions is substantially different from those for CoFe/Mg/MgO especially in the pre-annealed samples due to the formation of boron oxide at the CoFeB/MgO interface. Annealing depletes boron at the interface thus requiring a finite Mg interface layer to prevent CoFeOx formation at the CoFeB/MgO interface so that the TSP values can be optimized by controlling Mg thickness.
OSTI ID:
22063925
Journal Information:
AIP Advances, Journal Name: AIP Advances Journal Issue: 1 Vol. 2; ISSN AAIDBI; ISSN 2158-3226
Country of Publication:
United States
Language:
English

Similar Records

Boron diffusion in magnetic tunnel junctions with MgO (001) barriers and CoFeB electrodes
Journal Article · Mon Jun 28 00:00:00 EDT 2010 · Applied Physics Letters · OSTI ID:21366997

Magnetic Characterization of CoFeB/MgO and CoFe/MgO Interfaces
Journal Article · Sun Dec 31 23:00:00 EST 2006 · Applied Physics Letters · OSTI ID:930658

Atomic-scale spectroscopic imaging of CoFeB/Mg-B-O/CoFeB magnetic tunnel junctions
Journal Article · Mon Jul 20 00:00:00 EDT 2009 · Applied Physics Letters · OSTI ID:21294196