skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Structure and properties of ZrN doped diamondlike carbon films prepared by pulsed bias arc ion plating

Journal Article · · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
DOI:https://doi.org/10.1116/1.3248274· OSTI ID:22053547
; ;  [1]
  1. Key Laboratory for Material Modification by Laser, Ion and Electron Beams, Dalian University of Technology, 116085 Dalian (China)

ZrN doped diamondlike carbon composite films with different compositions were deposited on cemented carbide substrates at different nitrogen flow rates by pulsed bias arc ion plating. Scanning electron microscopy results show that the film surfaces were all uniform, smooth, and dense. X-ray photoelectron spectroscopy reveal the C contents are more than 60%, the N content increases, and the Zr content decreases with increasing nitrogen flow rate. The Raman spectra indicated that the deposited films were diamondlike carbon. X-ray diffraction results suggested that a ZrN crystalline phase was also present in the films. The hardness and elastic modulus were closely related to the composition and structure of the films and decrease with increasing nitrogen flow rates, principally due to the increase in the sp{sup 2} content and the decrease in the ZrN crystalline phase.

OSTI ID:
22053547
Journal Information:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Vol. 27, Issue 6; Other Information: (c) 2009 American Vacuum Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 1553-1813
Country of Publication:
United States
Language:
English

Similar Records

Influence of deposition parameters on the microstructure and properties of nitrogen-doped diamondlike carbon films
Journal Article · Mon Nov 15 00:00:00 EST 2010 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:22053547

Effects of substrate bias and nitrogen flow ratio on the resistivity and crystal structure of reactively sputtered ZrN{sub x} films at elevated temperature
Journal Article · Sun Jul 15 00:00:00 EDT 2007 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films · OSTI ID:22053547

Effects of substrate bias and nitrogen flow ratio on the resistivity, density, stoichiometry, and crystal structure of reactively sputtered ZrN{sub x} thin films
Journal Article · Wed Sep 01 00:00:00 EDT 2004 · Journal of Vacuum Science and Technology. A, Vacuum, Surfaces and Films · OSTI ID:22053547