Effects of substrate bias and nitrogen flow ratio on the resistivity and crystal structure of reactively sputtered ZrN{sub x} films at elevated temperature
- Department of Electronic Materials, Far East University, Tainan 744, Taiwan (China)
ZrN{sub x} films were sputtered in an Ar+N{sub 2} atmosphere, with different substrate biases (zero to -200 V) at a 2% nitrogen flow ratio and various nitrogen flow ratios (%N{sub 2}=0.5%-24%) under -200 V of substrate bias. The resistivity, crystal structure, and compositional depth profiles of ZrN{sub x} films, before and after vacuum annealing at 500-900 deg. C, were investigated. At 2% N{sub 2}, the resistivity of ZrN{sub x} films decreases with increasing substrate bias due to reduction of incorporated oxygen and porosity. Additionally, the resistivity of -200 V biased ZrN{sub x} films (%N{sub 2}=2%) are about the same before and after annealing, but the resistivities of zero and -100 V biased ZrN{sub x} films increase with increasing annealing temperature. In addition, the ZrO{sub 2} phases (monoclinic and tetragonal) are found in ZrN{sub x} films deposited with 2% N{sub 2} and no substrate bias after annealing at 900 deg. C; however, ZrN and tetragonal ZrO{sub 2} phases are revealed in ZrN{sub x} films sputtered with a substrate bias at the same temperature. On the other hand, the resistivities of -200 V biased ZrN{sub x} films at high nitrogen flow ratio (%N{sub 2}>2%) increase after annealing at 500 deg. C, and then decrease with increasing annealing temperature, up to 900 deg. C. Furthermore, the major phase in 0.5%-24% N{sub 2} flow films with -200 V substrate bias is ZrN before and after annealing. Nitrogen outdiffusion is observed for ZrN{sub x} films after annealing at high temperature. The connection between the resistivity and crystal structure of ZrN{sub x} films and how they are influenced by the substrate bias, nitrogen flow ratio, and annealing temperature is discussed.
- OSTI ID:
- 20979486
- Journal Information:
- Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 25; ISSN 1553-1813
- Country of Publication:
- United States
- Language:
- English
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