Thermal stability and tribological properties of CrZr-Si-N films synthesized by closed field unbalanced magnetron sputtering

Journal Article · Wed Jul 15 04:00:00 EDT 2009 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3116589· OSTI ID:22053510

Lee, Sang Yul; Kim, Young Su; Kim, Gwang Seok ^[1]

---

1. Department of Materials Engineering, Korea Aerospace University, Hangkongdae-Gil 100, KoYang-Si, KyungKi-Do 412-791 (Korea, Republic of)

In this work, CrZr-Si-N films with various Si contents ({<=}6.4 at. %) were synthesized by closed field unbalanced magnetron sputtering with vertical magnetron sources. The characteristics such as hardness, surface morphology, and friction coefficient of the films as a function of the Si content after annealing up to 500 degree sign C in air were evaluated. Results revealed that the as-deposited films showed very similar characteristics irrespective of the Si content. However, after annealing at 500 degree sign C, the film characteristics showed a strong dependency upon the Si content. After annealing at 500 degree sign C, the hardness of the Cr{sub 39.4}Zr{sub 12.3}N{sub 48.3} film decreased significantly to approximately 24 GPa and the surface roughness value increased approximately 3.5 times more than that of the as-deposited film. The Cr{sub 34.6}Zr{sub 10.6}-Si{sub 6.4}-N{sub 48.4} film, however, was observed to have a hardness of approximately 30 GPa, which is close to that of the as-deposited film, 32 GPa. In addition, as the wear test temperature increased from room temperature to 500 degree sign C, the average friction coefficient of the Cr{sub 39.4}Zr{sub 12.3}N{sub 48.3} film increased significantly from approximately 0.23 to 0.81, but the average friction coefficient of the Cr{sub 34.6}Zr{sub 10.6}-Si{sub 6.4}-N{sub 48.4} film was not changed extensively, measuring approximately 0.43. These results could be attributed to the improvement of the thermal stability by adding Si into the Cr-Zr-N films.

• OSTI ID: 22053510
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 27; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANNEALING
CHROMIUM COMPOUNDS
DEPOSITION
FRICTION FACTOR
HARDNESS
MORPHOLOGY
PHASE STABILITY
PRESSURE RANGE GIGA PA
ROUGHNESS
SILICON
SILICON NITRIDES
SPUTTERING
SURFACES
TEMPERATURE DEPENDENCE
THIN FILMS
WEAR
ZIRCONIUM SILICIDES