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Thermal stability of sputter deposited nanomosaic rutile TiO{sub 2}

Journal Article · · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films
DOI:https://doi.org/10.1116/1.3139900· OSTI ID:22053494
 [1]
  1. Department of Materials and the Advanced Coatings Experimental Laboratory, College of Engineering and Applied Science, University of Wisconsin-Milwaukee, P.O. Box 784, Milwaukee, Wisconsin 53201 (United States)
A domain structure based on the rutile lattice with a large density of (1/2)<011>{l_brace}011{r_brace}-type stacking faults is found in sputter deposited TiO{sub 2} films [J. Vac. Sci. Technol. A 24, 2054 (2006)]. The thermal stability of nanomosaic rutile at moderate temperature is reported here. Films are annealed at 973 K for 0.25-15 h, characterized by x-ray diffraction. A Johnson-Mehl-Avrami-Kolmogorov analysis indicates impeded crystallite growth. A dislocation-locking mechanism is proposed for this behavior. Partial dislocations with (1/2)<011> Burgers vectors that bound the stacking faults glide on intersecting {l_brace}011{r_brace} slip planes and react to produce sessile stair rod dislocations. Without the high temperature required for dislocation climb, (1/2)<011>{l_brace}011{r_brace}-type faults inherent to nanomosaic rutile provide thermal stability against massive crystallite growth.
OSTI ID:
22053494
Journal Information:
Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 4 Vol. 27; ISSN 1553-1813
Country of Publication:
United States
Language:
English