Characterization of x-ray photocathode in transmission mode for imaging application

Journal Article · Tue Sep 15 04:00:00 EDT 2009 · Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films

DOI:https://doi.org/10.1116/1.3168559· OSTI ID:22051006

Ikeura-Sekiguchi, Hiromi; Sekiguchi, Tetsuhiro; Koike, Masaki; Yagi-Watanabe, Kazutoshi ^[1]

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1. National Institute of Advanced Industrial Science and Technology (AIST), Central 2-5, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568 (Japan)

The performance of an Al x-ray transmission photocathode was experimentally characterized by measuring the total electron yield from backsurface photocathodes of varying thickness. It was demonstrated that the backsurface electron yield is proportional to the x-ray photocurrent transmitted through the photocathode for thicknesses thicker than the optimum thickness. The optimum photocathode thickness with the highest conversion efficiency was found to be approximately 70 nm at 2.963 keV. An escape depth of the secondary electrons was determined to be approximately 13 nm from the yield-versus-thickness data fitted with a semiempirical equation. Using this parameter, the dependence of the optimum photocathode thickness on the x-ray energy was calculated for the 30-10000 eV range. As one example of imaging applications, different photoemission images in the transmission and reflection modes are also presented.

• OSTI ID: 22051006
• Journal Information: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films, Journal Name: Journal of Vacuum Science and Technology. A, International Journal Devoted to Vacuum, Surfaces, and Films Journal Issue: 5 Vol. 27; ISSN 1553-1813
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ALUMINIUM
ELECTRONS
EV RANGE
KEV RANGE
PHOTOCATHODES
PHOTOCONDUCTIVITY
PHOTOEMISSION
THICKNESS
TRANSMISSION
X RADIATION
YIELDS