Subwavelength nanopatterning of photochromic diarylethene films

Journal Article · Mon Apr 30 00:00:00 EDT 2012 · Applied Physics Letters

DOI:https://doi.org/10.1063/1.4710547· OSTI ID:22025536

Cantu, Precious; Brimhall, Nicole; Menon, Rajesh ^[1]; Andrew, Trisha L ^[2]; Castagna, Rossella; Bertarelli, Chiara ^[3]

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1. Department of Electrical and Computer Engineering, University of Utah, Salt Lake City, Utah 84112 (United States)
2. Department of Chemistry, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139 (United States)
3. Dipartimento di Chimica, Materiali e Ingegneria Chimica ''Giulio Natta'', Politecnico di Milano, P.zza Leonardo da Vinci 32, 20133 Milano (Italy)

The resolution of optical patterning is constrained by the far-field diffraction limit. In this letter, we describe an approach that exploits the unique photo- and electro-chemistry of diarylethene photochromic molecules to overcome this diffraction limit and achieve sub-wavelength nanopatterning.

• OSTI ID: 22025536
• Journal Information: Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 18 Vol. 100; ISSN APPLAB; ISSN 0003-6951
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
37 INORGANIC, ORGANIC, PHYSICAL, AND ANALYTICAL CHEMISTRY
DIFFRACTION
ELECTROCHEMISTRY
MOLECULES
ORGANIC COMPOUNDS
PHOTOCHEMISTRY
PHOTOCHROMIC MATERIALS
RESOLUTION
THIN FILMS
VACUUM COATING
VISIBLE RADIATION
WAVELENGTHS