Textured growth of Co film on CoO (fcc) layer; Structural studies using EDXRD beamline at Indus-2

Journal Article · Tue Jun 05 04:00:00 EDT 2012 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.4710206· OSTI ID:22004142

Kumar, Dileep; Patidar, P; Sant, T; Pandey, K K; Gupta, A; Sharma, S M ^[1]

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1. UGC-DAE Consortium for Scientific Research, University Campus, Khandwa Road, Indore - 452 017 (India)

Co film of 13 nm thickness has been deposited on native oxide (CoO) layer using electron beam evaporation technique. CoO (fcc) of 2.3 nm thickness has been prepared by oxidizing surface of 50 nm thick Co (fcc) by thermal annealing. The structure of the sample has been investigated in detail using in-plane and out-of-plane energy dispersive grazing incidence x-ray diffraction (GIXRD) at EDXRD beamline, Indus-2, RRCAT, Indore. It is found that the growth of the Co film takes place with preferential orientation of c-axis perpendicular to the film plane, which results in structure induced magnetic anisotropy with easy axis normal to the film plane.

• OSTI ID: 22004142
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1447; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
ANISOTROPY
ANNEALING
COATINGS
COBALT
COBALT OXIDES
CRYSTAL GROWTH
ELECTRON BEAMS
EVAPORATION
FCC LATTICES
INDUS-2
LAYERS
ORIENTATION
SURFACES
TEXTURE
THIN FILMS
X-RAY DIFFRACTION