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Title: Studies of Valence Band Alignment Between Nitrided GaPN/GaP (111) Interface Using X-ray Photoelectron Spectroscopy

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3606242· OSTI ID:21608125
; ;  [1]; ;  [2];
  1. Raja Ramanna Centre for Advanced Technology, Indore-452013, M.P. (India)
  2. UGC-DAE Consortium for Scientific Research, Khandwa Road, Indore 452001, M.P. (India)

The analysis of core levels positions of Ga{sub 3}d, N{sub 1s} and P{sub 2}p at different etching depth from the plasma nitrided GaP (111) surface shows that the nitrogen ions interact with both Gallium and Phosphorous ions with nearly equal probability. The analysis of valence band spectra shows the type-II band alignment between GaPN{sub 0.22}/GaP and the valence band offset is {approx}2.2{+-}0.1 eV.

OSTI ID:
21608125
Journal Information:
AIP Conference Proceedings, Vol. 1349, Issue 1; Conference: 55. DAE solid state physics symposium 2010, Manipal (India), 26-30 Dec 2010; Other Information: DOI: 10.1063/1.3606242; (c) 2011 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
Country of Publication:
United States
Language:
English