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Title: Nanopatterning of Si surfaces by normal incident ion erosion: Influence of iron incorporation on surface morphology evolution

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3585796· OSTI ID:21560272
 [1]; ;  [1];  [2]
  1. Institute of Ion Beam Physics and Materials Research, Helmholtz-Zentrum Dresden-Rossendorf, P.O. Box 510119, D-01314 Dresden (Germany)
  2. Department of Optics Science and Engineering, Fudan University, Shanghai 200433 (China)

The surface morphology of Si(100) induced by 1200 eV Ar{sup +} ion bombardment at normal incidence with and without Fe incorporation is presented. The formation of nanodot patterns is observed only when the stationary Fe areal density in the surface is above a threshold value of 8x10{sup 14} cm{sup -2}. This result is interpreted in terms of an additional surface instability due to locally nonuniform sputtering in connection with the presence of a Fe rich amorphous phase at the peak of the nanodots. At Fe concentrations below the threshold, smoothing dominates and pattern formation is inhibited. The transition from a k{sup -2} to a k{sup -4} behavior in the asymptotic power spectral density function supports the conclusion that under these conditions ballistic smoothing and ion-enhanced viscous flow are the two dominant mechanisms of surface relaxation.

OSTI ID:
21560272
Journal Information:
Journal of Applied Physics, Vol. 109, Issue 10; Other Information: DOI: 10.1063/1.3585796; (c) 2011 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English