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Title: Major deep levels with the same microstructures observed in n-type 4H-SiC and 6H-SiC

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3528124· OSTI ID:21538024
; ; ; ;  [1]
  1. Department of Electronic Science and Engineering, Kyoto University, Katsura, Nishikyo, Kyoto 615-8510 (Japan)

Major deep levels observed in as-grown and irradiated n-type 4H-SiC and 6H-SiC epilayers have been investigated. After low-energy electron irradiation, by which only carbon atoms are displaced, five traps, EH1 (E{sub C}-0.36 eV), Z{sub 1}/Z{sub 2} (E{sub C}-0.65 eV), EH3 (E{sub C}-0.79 eV), EH5 (E{sub C}-1.0 eV), and EH6/7 (E{sub C}-1.48 eV), were detected in 4H-SiC and four traps, E{sub 1}/E{sub 2} (E{sub C}-0.45 eV), RD{sub 5} (E{sub C}-0.57 eV), ES (E{sub C}-0.80 eV), and R (E{sub C}-1.25 eV), were detected in 6H-SiC. The Z{sub 1}/Z{sub 2}, EH6/7 centers in 4H-SiC and the E{sub 1}/E{sub 2}, R centers in 6H-SiC exhibit common features as follows: their generation rates by the e{sup -}-irradiation were almost the same each other, their concentrations were not changed by heat treatments up to 1500 deg. C, and they showed very similar annealing behaviors at elevated temperatures. Furthermore, these defect centers were almost eliminated by thermal oxidation. Taking account of the observed results and the energy positions, the authors suggest that the Z{sub 1}/Z{sub 2} center in 4H-SiC corresponds to the E{sub 1}/E{sub 2} center in 6H-SiC, and the EH6/7 center in 4H-SiC to the R center in 6H-SiC, respectively. Since the concentrations of these four centers are almost the same for as-grown, electron-irradiated, annealed, and oxidized samples, these centers will contain a common intrinsic defect, most likely carbon vacancy. The authors also observed similar correspondence for other thermally unstable traps in 4H-SiC and 6H-SiC.

OSTI ID:
21538024
Journal Information:
Journal of Applied Physics, Vol. 109, Issue 1; Other Information: DOI: 10.1063/1.3528124; (c) 2011 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English