Plasma Sputter-type Ion Source with Wire Electrodes for Low-energy Gallium Ion Extraction
- Graduate School of Engineering, Doshisha University, Kyotanabe, Kyoto 610-0321 (Japan)
- Novelion Systems Co. Ltd., Kyotanabe, Kyoto 610-0332 (Japan)
- Nissin Ion Equipment Co. Ltd., Minami-ku, Kyoto 601-8205 (Japan)
Low-energy ions of gallium (Ga) and argon (Ar) were extracted from a plasma sputter-type ion source system that utilized a tungsten (W) wire extractor geometry. The 90% transparent W wire extractor configuration had shown that the system was capable of producing an ion beam with the energy as low as 10 eV in a dc filament discharge and 50 eV in a radio frequency (rf) excited system. In the present investigation, Ar plasma was sustained in an ion source chamber through an inductively coupled 13.56 MHz rf power source. Negatively biased liquid Ga target suspended on a W reservoir was sputtered and postionized prior to extraction. Mass spectral analyses revealed a strong dependence of the Ga{sup +} current on the induced target bias.
- OSTI ID:
- 21513150
- Journal Information:
- AIP Conference Proceedings, Vol. 1321, Issue 1; Conference: IIT 2010: 18. international conference on ion implantation technology, Kyoto (Japan), 6-11 Jun 2010; Other Information: DOI: 10.1063/1.3548453; (c) 2010 American Institute of Physics; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
GENERAL PHYSICS
ARGON IONS
CONFIGURATION
ELECTRODES
EV RANGE 01-10
GALLIUM IONS
ION BEAMS
ION IMPLANTATION
ION SOURCES
LIQUID CRYSTALS
MASS
MHZ RANGE
PLASMA
RADIOWAVE RADIATION
SPUTTERING
TUNGSTEN
WIRES
BEAMS
CHARGED PARTICLES
CRYSTALS
ELECTROMAGNETIC RADIATION
ELEMENTS
ENERGY RANGE
EV RANGE
FLUIDS
FREQUENCY RANGE
IONS
LIQUIDS
METALS
RADIATIONS
REFRACTORY METALS
TRANSITION ELEMENTS