Evaluation of Surface Damage of Organic Films due to Irradiation with Energetic Ion Beams

Journal Article · Fri Jan 07 04:00:00 EST 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3548390· OSTI ID:21513140

Hada, Masaki; Hontani, Yusaku; Ichiki, Kazuya; Seki, Toshio ^[1]; Ibuki, Sachi; Ninomiya, Satoshi; Matsuo, Jiro ^[2]; Aoki, Takaaki ^[3]

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1. Department of Nuclear Engineering, Kyoto University, Sakyo, Kyoto, 606-8501 (Japan)
2. Quantum Science and Engineering Center, Kyoto University, Gokasho, Uji, Kyoto 611-0011 (Japan)
3. Department of Electronic Science and Engineering, Kyoto University, Nishigyo, Kyoto, 615-8530 (Japan)

The surface of L-leucine films irradiated with an Ar{sub 5000} cluster ion beam (5 keV) was characterized by using the X-ray reflective (XRR) measurement method, atomic force microscopy (AFM) and ellipsometry. No significant damage was detected on the surface of the L-leucine films irradiated with the Ar cluster ion beam. Therefore, the large cluster-low-energy (about 1 eV/atom) beam would be suitable for low-damage etching of organic materials.

• OSTI ID: 21513140
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1321; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

75 CONDENSED MATTER PHYSICS
SUPERCONDUCTIVITY AND SUPERFLUIDITY
AMINO ACIDS
ARGON
ATOMIC CLUSTERS
ATOMIC FORCE MICROSCOPY
ATOMS
BEAMS
CARBOXYLIC ACIDS
CHARGED PARTICLES
DAMAGE
ELECTROMAGNETIC RADIATION
ELEMENTS
ELLIPSOMETRY
ENERGY RANGE
ETCHING
FILMS
FLUIDS
GASES
ION BEAMS
ION PAIRS
IONIZING RADIATIONS
IONS
IRRADIATION
KEV RANGE
KEV RANGE 01-10
LEUCINE
MAGNETIC MATERIALS
MATERIALS
MATTER
MEASURING METHODS
MICROSCOPY
NONMETALS
OPTICAL PROPERTIES
ORGANIC ACIDS
ORGANIC COMPOUNDS
ORGANIC MATTER
PHYSICAL PROPERTIES
RADIATIONS
RARE GASES
REFLECTIVITY
SURFACE FINISHING
SURFACE PROPERTIES
SURFACES
TAIL IONS
X RADIATION