Low Temperature, Self-nucleated Growth of Indium Tin Oxide Nanostructures by Pulsed Laser Deposition in Argon

Journal Article · Wed Mar 30 00:00:00 EDT 2011 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3573760· OSTI ID:21511551

Tan, S S; Lee, W K; Kee, Y Y; Wong, H Y; Tou, T Y ^[1]

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1. Faculty of Engineering, Multimedia University, 63100 Cyberjaya (Malaysia)

Indium tin oxide (ITO) nanostructures were successfully deposited on glass substrate by pulsed laser ablation in argon gas at 250 deg. C. Microstructural changes were observed in the argon gas pressure between 30 to 50 mTorr. The as-grown, nanostructured ITO exhibit In{sub 2}O{sub 3} bixbyite structure orientated at <111> direction. At the initial stage of growth, there was a large number of nucleation sites detected which eventually evolved into needle-like branches. The presence of spheres at the tip of these branches indicates that these nanostructured ITO were likely governed by vapor-liquid-solid (VLS) growth mechanism.

• OSTI ID: 21511551
• Journal Information: AIP Conference Proceedings, Vol. 1328, Issue 1; Conference: PERFIK-2010: Malaysia annual physics conference 2010, Damai Laut (Malaysia), 27-30 Oct 2010; Other Information: DOI: 10.1063/1.3573760; (c) 2011 American Institute of Physics; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

77 NANOSCIENCE AND NANOTECHNOLOGY
ABLATION
ARGON
ENERGY BEAM DEPOSITION
GLASS
GROWTH
INDIUM OXIDES
LASER RADIATION
MICROSTRUCTURE
NANOSTRUCTURES
NUCLEATION
PULSED IRRADIATION
SCANNING ELECTRON MICROSCOPY
SOLIDS
SUBSTRATES
TEMPERATURE RANGE 0400-1000 K
TIN OXIDES
X-RAY DIFFRACTION
CHALCOGENIDES
COHERENT SCATTERING
DEPOSITION
DIFFRACTION
ELECTROMAGNETIC RADIATION
ELECTRON MICROSCOPY
ELEMENTS
FLUIDS
GASES
INDIUM COMPOUNDS
IRRADIATION
MICROSCOPY
NONMETALS
OXIDES
OXYGEN COMPOUNDS
RADIATIONS
RARE GASES
SCATTERING
SURFACE COATING
TEMPERATURE RANGE
TIN COMPOUNDS