Zinc Oxide Thin Films Fabricated with Direct Current Magnetron Sputtering Deposition Technique
- Centre for Advanced Devices and Systems (CADS), Faculty of Engineering, Multimedia University, Selangor Darul Ehsan (Malaysia)
Zinc oxide (ZnO) is a very promising material for emerging large area electronic applications including thin-film sensors, transistors and solar cells. We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 100 nm to 1020 nm were deposited on silicon (Si) substrate. The deposition pressure was varied from 12 mTorr to 25 mTorr. The influences of the film thickness and the deposition pressure on structural properties of the ZnO films were investigated using Mahr surface profilometer and atomic force microscopy (AFM). The experimental results reveal that the film thickness and the deposition pressure play significant role in the structural formation of the deposited ZnO thin films. ZnO films deposited on Si substrates are promising for variety of thin-film sensor applications.
- OSTI ID:
- 21511542
- Journal Information:
- AIP Conference Proceedings, Vol. 1328, Issue 1; Conference: PERFIK-2010: Malaysia annual physics conference 2010, Damai Laut (Malaysia), 27-30 Oct 2010; Other Information: DOI: 10.1063/1.3573740; (c) 2011 American Institute of Physics; ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
ATOMIC FORCE MICROSCOPY
DEPOSITION
DIRECT CURRENT
MAGNETRONS
SENSORS
SILICON
SOLAR CELLS
SPUTTERING
SUBSTRATES
SURFACES
THICKNESS
THIN FILMS
ZINC OXIDES
CHALCOGENIDES
CURRENTS
DIMENSIONS
DIRECT ENERGY CONVERTERS
ELECTRIC CURRENTS
ELECTRON TUBES
ELECTRONIC EQUIPMENT
ELEMENTS
EQUIPMENT
FILMS
MICROSCOPY
MICROWAVE EQUIPMENT
MICROWAVE TUBES
OXIDES
OXYGEN COMPOUNDS
PHOTOELECTRIC CELLS
PHOTOVOLTAIC CELLS
SEMIMETALS
SOLAR EQUIPMENT
ZINC COMPOUNDS