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Influence of the substrate stiffness on the crystallization process of sputtered TbFe{sub 2} thin films

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3410934· OSTI ID:21476294
 [1]; ; ;  [2]
  1. Dpto. Fisica de Materiales, Facultad CC. Fisicas, Universidad Complutense de Madrid, Ciudad Universitaria s/n, Madrid 28040 (Spain)
  2. ISOM and Dpto. Fisica Aplicada, E. T. S. I. Telecomunicacion, Universidad Politecnica de Madrid, Ciudad Universitaria s/n, Madrid 28040 (Spain)
Despite the giant magnetostriction of TbFe{sub 2}, this material has a very limited popularity in real applications, due to the difficulties for obtaining the Laves phase on thin films. Here we report on the properties of annealed TbFe{sub 2} films deposited by sputtering on different substrates and with different buffer materials. We find that the presence of the highly magnetostrictive Laves phase is not necessarily related to crystallinity of the substrate. Strikingly we find a correlation between the degree of TbFe{sub 2} crystallization and the rigidity of the substrate or the buffer layer underneath the TbFe{sub 2}. This opens the possibility of easy manufacturing of devices based on TbFe{sub 2} layers.
OSTI ID:
21476294
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 11 Vol. 107; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English