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Title: Epitaxial growth, electrical and optical properties of a-plane InN on r-plane sapphire

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3284086· OSTI ID:21476114
; ; ; ; ;  [1]
  1. Microelectronics Research Group, IESL, FORTH, P.O. Box 1385, 71110 Heraklion-Crete (Greece)

The heteroepitaxy of a-plane (1120) InN films on r-plane (1102) sapphire substrates, by nitrogen radio frequency plasma-assisted molecular beam epitaxy, has been investigated and compared to that of c-plane (0001) InN. The epitaxial growth of a-plane InN proceeded through the nucleation, growth, and coalescence of three-dimensional islands, resulting in surface roughness that increased monotonically with epilayer thickness. The full width at half maximum of (1120) x-ray diffraction rocking curves decreased significantly with increasing InN thickness, characteristic of structural improvement, and it reached the value of 24 arcmin for a 1 {mu}m thick film. Hall-effect measurements exhibited a similar dependence of electron concentration and mobility on thickness for both the a- and c-plane InN films. The analysis of the Hall-effect measurements, by considering the contribution of two conducting layers, indicates a similar accumulation of low mobility electrons with N{sub s}>10{sup 14} cm{sup -2} at the films' surface/interfacial region for both the a- and c-plane InN films. From optical transmittance measurements, the absorption edge of 0.768 eV was determined for the 1 {mu}m a-plane film, consistent with the expected Burstein-Moss effect. Photoluminescence spectra exhibited a lower energy peak at 0.631 eV, suggesting defect-related transitions.

OSTI ID:
21476114
Journal Information:
Journal of Applied Physics, Vol. 107, Issue 2; Other Information: DOI: 10.1063/1.3284086; (c) 2010 American Institute of Physics; ISSN 0021-8979
Country of Publication:
United States
Language:
English

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