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Title: Photovoltaic characteristics of Pd doped amorphous carbon film/SiO{sub 2}/Si

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3478230· OSTI ID:21466886
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  1. College of Physics Science and Technology, China University of Petroleum, Dongying, Shandong 257061 (China)

The Pd doped amorphous carbon (a-C:Pd) films were deposited on n-Si substrates with or without a native SiO{sub 2} layer using magnetron sputtering. The photovoltaic characteristics of the a-C:Pd/SiO{sub 2}/Si and a-C:Pd/Si junctions were studied. It is found that under light illumination of 15 mW/cm{sup 2} at room temperature, the a-C:Pd/SiO{sub 2}/Si solar cell fabricated at 350 deg. C has a high power conversion efficiency of 4.7%, which is much better than the a-C/Si junctions reported before. The enhanced conversion efficiency is ascribed to the Pd doping and the increase in sp{sup 2}-bonded carbon clusters in the carbon film caused by the high temperature deposition.

OSTI ID:
21466886
Journal Information:
Applied Physics Letters, Vol. 97, Issue 6; Other Information: DOI: 10.1063/1.3478230; (c) 2010 American Institute of Physics; ISSN 0003-6951
Country of Publication:
United States
Language:
English