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Title: Cubic AlGaN/GaN Hetero-Junction Field-Effect Transistors with Normally-on and Normally-off Characteristics

Journal Article · · AIP Conference Proceedings
DOI:https://doi.org/10.1063/1.3518285· OSTI ID:21428726
 [1]
  1. University of Paderborn, Faculty of Science, Department of Physics, Warburger Strasse 100 D-33098 Paderborn (Germany)

The growth of cubic group III-nitrides is a direct way to eliminate polarization effects, which inherently limit the fabrication of normally-off hetero-junction field-effect transistors (HFETs) in GaN technology. HFET structures were fabricated of non-polar cubic AlGaN/GaN hetero layers grown by plasma assisted molecular beam epitaxy on free standing 3C-SiC (001). The electrical insulation of 3C-SiC was realized by Ar{sup +} implantation before c-AlGaN/GaN growth. HFETs with normally-off and normally-on characteristics were fabricated of cubic AlGaN/GaN. Capacitance-voltage characteristics of the gate contact were performed to detect the electron channel at the c-AlGaN/GaN hetero-interface.

OSTI ID:
21428726
Journal Information:
AIP Conference Proceedings, Vol. 1292, Issue 1; Conference: E-MRS Symposium F: 2010 wide bandgap cubic semiconductors - From growth to devices, Strasbourg (France), 8-10 Oct 2010; Other Information: DOI: 10.1063/1.3518285; (c) 2010 American Institute of Physics; ISSN 0094-243X
Country of Publication:
United States
Language:
English