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The effect of MgO barrier on the structure and magnetic properties of Co{sub 2}MnSi films on n-Si(100) substrates

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3260253· OSTI ID:21361930
; ; ;  [1]
  1. Department of Applied Physics, Tohoku University, Sendai 980-8579 (Japan)
We investigated the structure and magnetic properties of Co{sub 2}MnSi/MgO/n-Si(100) films with the goal of achieving efficient spin injection. The Co{sub 2}MnSi films were fabricated by dc sputtering and post annealed at 400 deg. C for 1 h. They were oriented along the <100> direction with a MgO barrier layer. A strong chemical reaction was observed between the Co{sub 2}MnSi thin films and n-Si substrates in the absence of the MgO barrier. The diffusion or chemical reaction may occur up to a MgO layer thickness of 2 nm. With a MgO layer that is 2 nm thick, Co{sub 2}MnSi possessed large saturation magnetization and low surface roughness at room temperature. The electrical (I-V) characteristics of Co{sub 2}MnSi/MgO(2 nm)/n-Si(100) obtained at various junction sizes were symmetric, suggesting that MgO was an effective tunnel barrier.
OSTI ID:
21361930
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 10 Vol. 106; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English