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Optical and structural properties of Eu-implanted In{sub x}Al{sub 1-x}N

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3245386· OSTI ID:21361886
; ; ;  [1]; ;  [2]; ;  [3];  [4]
  1. SUPA Department of Physics, Strathclyde University, Glasgow G4 0NG (United Kingdom)
  2. Instituut voor Kern-en Stralingsfysica and INPAC, K.U. Leuven, Leuven (Belgium)
  3. Instituto Tecnologico e Nuclear, UFA, Estrada Nacional 10, 2686-953 Sacavem (Portugal)
  4. SUPA Institute of Photonics, Strathclyde University, Glasgow G4 0NW (United Kingdom)

Off-axis implantation of 80 keV Eu ions into epitaxial c-plane InAlN/GaN bilayers confines rare-earth (RE) doping largely to the InAlN layer. Rutherford backscattering spectrometry and x-ray diffraction show good correlations between the Eu{sup 3+} emission linewidth and key structural parameters of In{sub x}Al{sub 1-x}N films on GaN in the composition range near lattice matching (xapprox0.17). In contrast to GaN:Eu, selectively excited photoluminescence (PL) and PL excitation spectra reveal the presence of a single dominant optical center in InAlN. Eu{sup 3+} emission from In{sub 0.13}Al{sub 0.87}N:Eu also shows significantly less thermal quenching than GaN:Eu. InAlN films are therefore superior to GaN for RE optical doping.

OSTI ID:
21361886
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 106; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English