Optical and structural properties of Eu-implanted In{sub x}Al{sub 1-x}N
- SUPA Department of Physics, Strathclyde University, Glasgow G4 0NG (United Kingdom)
- Instituut voor Kern-en Stralingsfysica and INPAC, K.U. Leuven, Leuven (Belgium)
- Instituto Tecnologico e Nuclear, UFA, Estrada Nacional 10, 2686-953 Sacavem (Portugal)
- SUPA Institute of Photonics, Strathclyde University, Glasgow G4 0NW (United Kingdom)
Off-axis implantation of 80 keV Eu ions into epitaxial c-plane InAlN/GaN bilayers confines rare-earth (RE) doping largely to the InAlN layer. Rutherford backscattering spectrometry and x-ray diffraction show good correlations between the Eu{sup 3+} emission linewidth and key structural parameters of In{sub x}Al{sub 1-x}N films on GaN in the composition range near lattice matching (xapprox0.17). In contrast to GaN:Eu, selectively excited photoluminescence (PL) and PL excitation spectra reveal the presence of a single dominant optical center in InAlN. Eu{sup 3+} emission from In{sub 0.13}Al{sub 0.87}N:Eu also shows significantly less thermal quenching than GaN:Eu. InAlN films are therefore superior to GaN for RE optical doping.
- OSTI ID:
- 21361886
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 106; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Photoluminescence of Eu-doped GaN thin films prepared by radio frequency magnetron sputtering
Optically active centers in Eu implanted, Eu in situ doped GaN, and Eu doped GaN quantum dots
Related Subjects
ALUMINIUM COMPOUNDS
ALUMINIUM NITRIDES
CHARGED PARTICLES
COHERENT SCATTERING
CRYSTAL GROWTH METHODS
DIFFRACTION
EMISSION
ENERGY RANGE
ENERGY-LEVEL TRANSITIONS
EPITAXY
EUROPIUM IONS
EXCITATION
FILMS
GALLIUM COMPOUNDS
GALLIUM NITRIDES
INDIUM COMPOUNDS
INDIUM NITRIDES
ION IMPLANTATION
IONS
KEV RANGE
KEV RANGE 10-100
LAYERS
LUMINESCENCE
MATERIALS
NITRIDES
NITROGEN COMPOUNDS
PHOTOLUMINESCENCE
PHOTON EMISSION
PNICTIDES
RUTHERFORD BACKSCATTERING SPECTROSCOPY
SCATTERING
SEMICONDUCTOR MATERIALS
SPECTROSCOPY
THIN FILMS
X-RAY DIFFRACTION