Rapid thermal annealing effect on amorphous hydrocarbon film deposited by CH{sub 4}/Ar dielectric barrier discharge plasma on Si wafer: Surface morphology and chemical evaluation
Journal Article
·
· Journal of Applied Physics
- Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald (Germany)
- Surface Physics Division, Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata 700 064 (India)
The effects of rapid thermal annealing (RTA) on amorphous hydrogenated carbon-coated film on Si wafer, deposited by CH{sub 4}/Ar dielectric barrier discharge plasma (at half of the atmospheric pressure), was examined. Bubbles-like structures were formed on the surface of the deposited carbon-coated film. The surface morphology studied by scanning electron microscopy (SEM), which showed that the effect of RTA on the film changing the morphological property drastically at 600 deg. C and most of the bubbles started evaporating above 200 deg. C. The inbuilt energy dispersive x-ray in SEM gives the quantitative analysis of the annealed surface. X-ray photoelectron spectroscopy results of the as-deposited films agree with the IR results in that the percent of Si-CH{sub 3}, Si-O-Si and C-O(H) stretching vibrational band in the film. Most of these bands disappeared as the sample was annealed at 600 deg. C in Ar medium.
- OSTI ID:
- 21356153
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 9 Vol. 105; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
ALKANES
AMORPHOUS STATE
ANNEALING
ARGON
ATMOSPHERIC PRESSURE
BUBBLES
CARBON
CHEMICAL ANALYSIS
CHEMICAL REACTIONS
DEPOSITION
DIELECTRIC MATERIALS
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY LEVELS
EVAPORATION
EXCITED STATES
FILMS
FLUIDS
GASES
HEAT TREATMENTS
HYDROCARBONS
HYDROGEN
HYDROGENATION
MATERIALS
METHANE
MICROSCOPY
MORPHOLOGY
NONMETALS
ORGANIC COMPOUNDS
PHASE TRANSFORMATIONS
PHOTOELECTRON SPECTROSCOPY
PLASMA
RARE GASES
SCANNING ELECTRON MICROSCOPY
SEMIMETALS
SILICON
SPECTROSCOPY
SURFACE COATING
THIN FILMS
VACUUM COATING
VIBRATIONAL STATES
X-RAY PHOTOELECTRON SPECTROSCOPY
ALKANES
AMORPHOUS STATE
ANNEALING
ARGON
ATMOSPHERIC PRESSURE
BUBBLES
CARBON
CHEMICAL ANALYSIS
CHEMICAL REACTIONS
DEPOSITION
DIELECTRIC MATERIALS
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY LEVELS
EVAPORATION
EXCITED STATES
FILMS
FLUIDS
GASES
HEAT TREATMENTS
HYDROCARBONS
HYDROGEN
HYDROGENATION
MATERIALS
METHANE
MICROSCOPY
MORPHOLOGY
NONMETALS
ORGANIC COMPOUNDS
PHASE TRANSFORMATIONS
PHOTOELECTRON SPECTROSCOPY
PLASMA
RARE GASES
SCANNING ELECTRON MICROSCOPY
SEMIMETALS
SILICON
SPECTROSCOPY
SURFACE COATING
THIN FILMS
VACUUM COATING
VIBRATIONAL STATES
X-RAY PHOTOELECTRON SPECTROSCOPY