Rapid thermal annealing effect on amorphous hydrocarbon film deposited by CH{sub 4}/Ar dielectric barrier discharge plasma on Si wafer: Surface morphology and chemical evaluation

Journal Article · Fri May 01 00:00:00 EDT 2009 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.3116734· OSTI ID:21356153

Majumdar, Abhijit; Hippler, Rainer ^[1]; Bhattacharayya, S R ^[2]

---

1. Institut fuer Physik, Ernst-Moritz-Arndt-Universitaet Greifswald, Felix-Hausdorff-Str. 6, 17489 Greifswald (Germany)
2. Surface Physics Division, Saha Institute of Nuclear Physics, 1/AF Bidhan Nagar, Kolkata 700 064 (India)

The effects of rapid thermal annealing (RTA) on amorphous hydrogenated carbon-coated film on Si wafer, deposited by CH{sub 4}/Ar dielectric barrier discharge plasma (at half of the atmospheric pressure), was examined. Bubbles-like structures were formed on the surface of the deposited carbon-coated film. The surface morphology studied by scanning electron microscopy (SEM), which showed that the effect of RTA on the film changing the morphological property drastically at 600 deg. C and most of the bubbles started evaporating above 200 deg. C. The inbuilt energy dispersive x-ray in SEM gives the quantitative analysis of the annealed surface. X-ray photoelectron spectroscopy results of the as-deposited films agree with the IR results in that the percent of Si-CH{sub 3}, Si-O-Si and C-O(H) stretching vibrational band in the film. Most of these bands disappeared as the sample was annealed at 600 deg. C in Ar medium.

• OSTI ID: 21356153
• Journal Information: Journal of Applied Physics, Vol. 105, Issue 9; Other Information: DOI: 10.1063/1.3116734; (c) 2009 American Institute of Physics; ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
AMORPHOUS STATE
ANNEALING
ARGON
ATMOSPHERIC PRESSURE
BUBBLES
CARBON
CHEMICAL ANALYSIS
DIELECTRIC MATERIALS
EVAPORATION
HYDROGEN
HYDROGENATION
METHANE
MORPHOLOGY
PLASMA
SCANNING ELECTRON MICROSCOPY
SILICON
THIN FILMS
VACUUM COATING
VIBRATIONAL STATES
X-RAY PHOTOELECTRON SPECTROSCOPY
ALKANES
CHEMICAL REACTIONS
DEPOSITION
ELECTRON MICROSCOPY
ELECTRON SPECTROSCOPY
ELEMENTS
ENERGY LEVELS
EXCITED STATES
FILMS
FLUIDS
GASES
HEAT TREATMENTS
HYDROCARBONS
MATERIALS
MICROSCOPY
NONMETALS
ORGANIC COMPOUNDS
PHASE TRANSFORMATIONS
PHOTOELECTRON SPECTROSCOPY
RARE GASES
SEMIMETALS
SPECTROSCOPY
SURFACE COATING