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Enhancement of conductivity and transmittance of ZnO films by post hydrogen plasma treatment

Journal Article · · Journal of Applied Physics
DOI:https://doi.org/10.1063/1.3108543· OSTI ID:21356115
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  1. Key Laboratory of Semiconductor Materials Science, Institute of Semiconductors, CAS, Beijing 100083 (China)
We studied the effects of hydrogen plasma treatment on the electrical and optical properties of ZnO films deposited by radio frequency magnetron sputtering. It is found that the ZnO:H film is highly transparent with the average transmittance of 92% in the visible range. Both carrier concentration and mobility are increased after hydrogen plasma treatment, correspondingly, the resistivity of the ZnO:H films achieves the order of 10{sup -3} OMEGA cm. We suggest that the incorporated hydrogen not only passivates most of the defects and/or acceptors present, but also introduces shallow donor states such as the V{sub O}-H complex and the interstitial hydrogen H{sub i}. Moreover, the annealing data indicate that H{sub i} is unstable in ZnO, while the V{sub O}-H complex remains stable on the whole at 400 deg. C, and the latter diffuses out when the annealing temperature increases to 500 deg. C. These results make ZnO:H more attractive for future applications as transparent conducting electrodes.
OSTI ID:
21356115
Journal Information:
Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 8 Vol. 105; ISSN JAPIAU; ISSN 0021-8979
Country of Publication:
United States
Language:
English