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Effect of V/III flux ratio on luminescence properties and defect formation of Er-doped GaN

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3306736· OSTI ID:21347261
; ; ; ;  [1];  [2]
  1. Institute of Applied Physics, University of Tsukuba, Tsukuba, Ibaraki 305-8573 (Japan)
  2. Research Institute for Computational Sciences, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki 305-8568 (Japan)
Erbium-doped GaN samples grown with different V/III ratios through gas source molecular beam epitaxy were prepared to investigate the influence of the V/III ratio on the defect formation and the optical activity of the Er-related luminescence center. Obvious V/III ratio dependence was observed in photoluminescence measurement. Positron annihilation spectroscopy measurements suggested that V{sub Ga}-V{sub N} vacancy-complexes formed in these samples and that the V{sub N}/V{sub Ga} ratio depended on the V/III ratio. The generation of Er-V{sub N} defect complexes, which act as high optical active luminescence centers, is suggested as the cause of improved optical properties of Er-doped GaN grown with a lower V/III ratio.
OSTI ID:
21347261
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 5 Vol. 96; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English