About the ions and neutral components in the Ar/Tetramethylsilane-RF-discharge
- Inst. f. Niedertemperatur-Plasmaphysik, Greifswald (Germany); and others
By reason of the approved properties of their polymers, silicon organic compounds are of special interest for the plasma assisted thin film deposition technology. Frequently used compounds are Hexamethy1disiloxane, Hexamethyldisilazane, Tetraethoxysilane, also the application of Tetramethylsilane Si(CH{sub 3}){sub 4} (TMS) is reported. TMS is of special interest, because this compound is formed in discharges with higher molecular silicon-organic monomers. Excitation, dissociation and dissociative ionization are fundamental processes in the plasma polymerization. Absolute partial and total electron impact ionization cross sections of TMS and its fragmentation behavior in an Ar/TMS-RF-discharge are presented here.
- OSTI ID:
- 212947
- Report Number(s):
- CONF-950749--
- Country of Publication:
- United States
- Language:
- English
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