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Epitaxial growth and characterization of Eu{sub 0.5}Sr{sub 0.5}CoO{sub 3} thin films by off-axis sputtering

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.3234372· OSTI ID:21294327
; ;  [1];  [1];  [2]
  1. Department of Physics and Research Center for Dielectric and Advanced Matter Physics, Pusan National University, Busan 609-735 (Korea, Republic of)
  2. Department of Advanced Materials Science, University of Tokyo, Chiba 277-8561 (Japan)

We report the epitaxial growth and physical properties of Eu{sub 0.5}Sr{sub 0.5}CoO{sub 3} (ESCO) thin films deposited on (001) LaAlO{sub 3} (LAO) and (001) SrTiO{sub 3} (STO) substrates by off-axis rf sputtering. The magnetic properties of a grown film are governed by the crystallinity of the thin film and strain effects due to the substrate. The temperature-dependent resistivity of an optimized ESCO thin film on a LAO substrate shows a characteristic sudden decrease near the ferromagnetic transition temperature, indicating metallic double-exchange-like behavior, while the resistivity of ESCO on a STO substrate displays insulatinglike behavior because of substrate strain. These results suggest that optimized ESCO film on LAO is ideal as a bottom electrode for strained dielectric and ferroelectric heterostructures.

OSTI ID:
21294327
Journal Information:
Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 12 Vol. 95; ISSN APPLAB; ISSN 0003-6951
Country of Publication:
United States
Language:
English