Quasi-single-crystal (001) SrTiO{sub 3} templates on Si
- Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, Wisconsin 53706 (United States)
- Oak Ridge National Laboratory, Center for Nanophase Materials Sciences, Oak Ridge, Tennessee 37830 (United States)
The integration of multifunctional oxides on semiconductor devices requires the formation of single-crystal-like oxide templates directly on silicon. We report the fabrication of quasi-single-crystal (001) SrTiO{sub 3} templates on (001) Si by annealing 100 nm thick molecular beam epitaxy-grown epitaxial SrTiO{sub 3} films at 900 deg. C. The full width at half maximum of the (002) rocking curve is 0.006 deg., which is much narrower than SrTiO{sub 3} bulk single crystals. An atomically smooth TiO{sub 2}-terminated surface is obtained by buffered-HF etching, which allows us to create functional oxide heterointerfaces on Si. Epitaxial SrRuO{sub 3} thin films grown on the quasi-single-crystal SrTiO{sub 3} template exhibit a superior crystalline quality and surface morphology.
- OSTI ID:
- 21294232
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 6 Vol. 95; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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