Optimization of Xenon Difluoride Vapor Delivery

Journal Article · Mon Nov 03 04:00:00 EST 2008 · AIP Conference Proceedings

DOI:https://doi.org/10.1063/1.3033633· OSTI ID:21251683

Sweeney, Joseph; Marganski, Paul; Kaim, Robert; Wodjenski, Mike; Gregg, John; Yedave, Sharad; Sergi, Steve; Bishop, Steve; Eldridge, David; Peng, Zou ^[1]

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1. ATMI, Inc., Danbury, Connecticut 06810 (United States)

Xenon difluoride (XeF{sub 2}) has been shown to provide many process benefits when used as a daily maintenance recipe for ion implant. Regularly flowing XeF{sub 2} into the ion source cleans the deposits generated by ion source operation. As a result, significant increases in productivity have been demonstrated. However, XeF{sub 2} is a toxic oxidizer that must be handled appropriately. Furthermore, it is a low vapor pressure solid under standard conditions ({approx}4.5 torr at 25 deg. C). These aspects present unique challenges for designing a package for delivering the chemistry to an ion implanter. To address these challenges, ATMI designed a high-performance, re-usable cylinder for dispensing XeF{sub 2} in an efficient and reliable manner. Data are presented showing specific attributes of the cylinder, such as the importance of internal heat transfer media and the cylinder valve size. The impact of mass flow controller (MFC) selection and ion source tube design on the flow rate of XeF{sub 2} are also discussed. Finally, cylinder release rate data are provided.

• OSTI ID: 21251683
• Journal Information: AIP Conference Proceedings, Journal Name: AIP Conference Proceedings Journal Issue: 1 Vol. 1066; ISSN APCPCS; ISSN 0094-243X
• Country of Publication: United States
• Language: English

Related Subjects

42 ENGINEERING
CYLINDERS
FLOW RATE
HEAT TRANSFER
ION IMPLANTATION
ION SOURCES
MAINTENANCE
OPTIMIZATION
OXIDIZERS
PERFORMANCE
PRODUCTIVITY
TOXICITY
TUBES
VALVES
VAPOR PRESSURE
VAPORS
XENON FLUORIDES