skip to main content
OSTI.GOV title logo U.S. Department of Energy
Office of Scientific and Technical Information

Title: Rapid Coarsening of Ion Beam Ripple Patterns by Defect Annihilation

Journal Article · · Physical Review Letters
; ;  [1];  [1];  [2];  [3]
  1. I. Physikalisches Institut, RWTH Aachen, 52056 Aachen (Germany)
  2. Institut fuer Theoretische Physik, Universitaet zu Koeln, 50937 Koeln, Zuelpicher Strasse 77 (Germany)
  3. II. Physikalisches Institut, Universitaet zu Koeln, 50937 Koeln, Zuelpicher Strasse 77 (Germany)

Ripple patterns formed on Pt(111) through grazing incidence ion beam erosion coarsen rapidly. At and below 450 K coarsening of the patterns is athermal and kinetic, unrelated to diffusion and surface free energy. Similar to the situation for sand dunes, coarsening takes place through annihilation reactions of mobile defects in the pattern. The defect velocity derived on the basis of a simple model agrees quantitatively with the velocity of monatomic steps illuminated by the ion beam.

OSTI ID:
21180366
Journal Information:
Physical Review Letters, Vol. 102, Issue 14; Other Information: DOI: 10.1103/PhysRevLett.102.146103; (c) 2009 The American Physical Society; Country of input: International Atomic Energy Agency (IAEA); ISSN 0031-9007
Country of Publication:
United States
Language:
English

Similar Records

Coarsening of ion-beam-induced surface ripple in Si: Nonlinear effect vs. geometrical shadowing
Journal Article · Wed Aug 15 00:00:00 EDT 2007 · Physical Review. B, Condensed Matter and Materials Physics · OSTI ID:21180366

Ripple pattern formation on silicon surfaces by low-energy ion-beam erosion: Experiment and theory
Journal Article · Thu Dec 15 00:00:00 EST 2005 · Physical Review. B, Condensed Matter and Materials Physics · OSTI ID:21180366

Formation and characterization of perpendicular mode Si ripples by glancing angle O{sub 2}{sup +} sputtering at room temperature
Journal Article · Sat Aug 15 00:00:00 EDT 2009 · Journal of Applied Physics · OSTI ID:21180366