Time-dependent gas phase kinetics in a hydrogen diluted silane plasma
- Research Center for Photovoltaics, National Institute of Advanced Industrial Science and Technology, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568 (Japan)
The gas phase kinetics in a high-pressure hydrogen diluted silane plasma has been studied at time scales of 10{sup -2}-6x10{sup 2} s. The time-resolved gas phase composition shows the following kinetics at different time scales: silane decomposition and polysilane generation in < or approx. 2x10{sup -1} s, nanoparticle formation and plasma density reduction in 10{sup -1}-10{sup 0} s, polysilane accumulation in 10{sup 0}-10{sup 2} s, and silane depletion and electrode heating in > or approx. 10{sup 1} s. Disilane radicals are implied to be the dominant film precursors in addition to silyl radicals.
- OSTI ID:
- 21175969
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 7 Vol. 94; ISSN APPLAB; ISSN 0003-6951
- Country of Publication:
- United States
- Language:
- English
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