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Title: Structural and optical properties of Cr-doped semi-insulating GaN epilayers

Journal Article · · Applied Physics Letters
DOI:https://doi.org/10.1063/1.2988000· OSTI ID:21175589
; ; ; ;  [1]; ;  [2]
  1. Key Laboratory of Acoustic and Photonic Materials and Devices of Ministry of Education and School of Physics and Technology, Wuhan University, Wuhan 430072 (China)
  2. Leibniz-Institut fuer Oberflaechenmodifizierung, D-04318 Leipzig (Germany)

The properties of Cr-doped GaN epilayers grown by rf-plasma-assisted molecular beam epitaxy were studied. The deep acceptor nature of Cr was used to grow semi-insulating GaN epilayers on sapphire substrates for electronic device applications. The room-temperature (RT) sheet resistivity of the epilayers reached 10{sup 10} {omega}/square. The activation energy of dark conductivity was about 0.48 eV. Step-graded Al{sub x}Ga{sub 1-x}N/GaN (x=0.3-0.2) superlattices (SLs) were designed to filter dislocations. Transmission electron microscopy images showed that the SLs can dramatically reduce dislocation density. Al{sub 0.35}Ga{sub 0.65}N/GaN heterostructure grown on Cr-doped semi-insulating GaN epilayer exhibited a RT mobility of 960 cm{sup 2}/V s and sheet carrier density of 2.1x10{sup 13} cm{sup -2}.

OSTI ID:
21175589
Journal Information:
Applied Physics Letters, Vol. 93, Issue 11; Other Information: DOI: 10.1063/1.2988000; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0003-6951
Country of Publication:
United States
Language:
English