Computational Analysis of Splash Occurring in the Deposition Process in Annular-Mist Flow
- Nuclear Engineering Research Laboratory, The University of Tokyo, 2-22 shirane, shirakata, Tokai-mura, Naka-gun, Ibaraki 319-1188 (Japan)
The deposition process of a single droplet on the film is numerically simulated by the Moving Particle Semi-implicit (MPS) method to analyze the possibility and effect of splash occurring in the deposition process in BWR condition. The model accounts for the presence of inertial, gravitation, viscous and surface tension and is validated by comparison with experiment results. A simple one-dimensional mixture model is developed to calculate the necessary parameters for the simulation of deposition in BWR condition. The deposition process of a single droplet in BWR condition is simulated. The effect of impact angle of droplet and the velocity of liquid film are analyzed. A film buffer model is developed to fit the simulation results of critical value for splash. A correlation of critical Weber number for splash in BWR condition is obtained and used to analyze the effect of splash. It is found that the splash play important role in the deposition and re-entrainment process in high quality condition in BWR. The mass fraction of re-entrainment caused by splash in different quality condition is also calculated. (authors)
- Research Organization:
- American Nuclear Society, 555 North Kensington Avenue, La Grange Park, IL 60526 (United States)
- OSTI ID:
- 21160556
- Resource Relation:
- Conference: ICAPP'04: 2004 international congress on advances in nuclear power plants, Pittsburgh, PA (United States), 13-17 Jun 2004; Other Information: Country of input: France; 29 refs; Related Information: In: Proceedings of the 2004 international congress on advances in nuclear power plants - ICAPP'04, 2338 pages.
- Country of Publication:
- United States
- Language:
- English
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