Effect of Post-deposition Annealing on the Physical Properties of DC Magnetron Sputtered Molybdenum Oxide Films
- Department of Physics, Sri Venkateswara University, Tirupati--517502 (India)
Molybdenum oxide films were deposited on glass and single crystal silicon substrates held at room temperature by sputtering of molybdenum target in an oxygen partial pressure of 2xl0{sup -4} mbar. The MoO{sub 3} films were annealed in oxygen atmosphere at various temperatures in the range 473-673 K. The effect of annealing temperature on the structure, chemical binding configuration, and optical properties of the MoO{sub 3} films was studied. The X-ray diffraction studies revealed that the as-deposited MoO{sub 3} films were amorphous. It crystallizes into a layered orthorhombic phase by the post-deposition annealing at a temperature of 673 K. The Fourier transform infrared spectrum of the MoO{sub 3} films annealed at 473 K exhibits the absorption bands at 560, 840 and 995 cm{sup -1} related to the active stretching modes of MoO{sub 6} octahedra. When the films annealed at 673 K the intensity of the absorption band observed at 560 cm{sup -1} diminished and the band of 995 cm{sup -1} split into two bands of 995 and 1010 cm{sup -1} which are related to the zig--zag rows of layered structure of MoO{sub 3}. The optical band gap of the as-deposited and annealed films was 3.07 and 3.20 eV respectively. The refractive index increased with increase of annealing temperature.
- OSTI ID:
- 21137065
- Journal Information:
- AIP Conference Proceedings, Vol. 1004, Issue 1; Conference: NCTP'07: 4. national conference on thermophysical properties, Kollam, Kerala (India), 20-23 Sep 2007; Other Information: DOI: 10.1063/1.2927584; (c) 2008 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0094-243X
- Country of Publication:
- United States
- Language:
- English
Similar Records
Characterization of reactively sputtered molybdenum oxide films for solar cell application
Thermoelectric properties of epitaxial ScN films deposited by reactive magnetron sputtering onto MgO(001) substrates