Turning electrospun poly(methyl methacrylate) nanofibers into graphitic nanostructures by in situ electron beam irradiation
- School of Physical Science and Technology, Lanzhou University, Lanzhou 730000 (China)
- Institute of Electrical Engineering, Chinese Academy of Sciences, Beijing 100080 (China)
Using ultrathin electrospun poly(methyl methacrylate) (PMMA) nanofibers as precursor, graphitic nanofibers, nanobridges, nanocones, and fullerenelike onions could be prepared by electron beam irradiation in a controlled manner. With the help of the high resolution transmission electron microscopy, the real time processing of the carbonization and graphitization of the PMMA nanofibers could be investigated. This way to obtain graphitic nanostructures has promising applications in graphitic carbon nanostructure electronics and devices. Because PMMA is a widely used standard high resolution electron resist, this graphitization could be combined with electron beam lithography to obtain high resolution patterned graphitic circuits.
- OSTI ID:
- 21133960
- Journal Information:
- Journal of Applied Physics, Journal Name: Journal of Applied Physics Journal Issue: 4 Vol. 103; ISSN JAPIAU; ISSN 0021-8979
- Country of Publication:
- United States
- Language:
- English
Similar Records
Application of poly(methyl methacrylate) ultrathin resist supported by a flowing subphase method in electron-beam fabrication of a 4in. high-resolution mask
Impact of post-treatment on the characteristics of electrospun poly (vinyl alcohol)/chitosan nanofibers