Study of magnetic properties and relaxation in amorphous Fe{sub 73.9}Nb{sub 3.1}Cu{sub 0.9}Si{sub 13.2}B{sub 8.9} thin films produced by ion beam sputtering

Journal Article · Wed Aug 15 00:00:00 EDT 2007 · Journal of Applied Physics

DOI:https://doi.org/10.1063/1.2775537· OSTI ID:21057505

Celegato, F; Coiesson, M; Magni, A; Tiberto, P; Vinai, F; Kane, S N; Modak, S S; Gupta, A; Sharma, P ^[1]

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1. Istituto Nazionale di Ricerca Metrologica (INRIM), Strada delle Cacce 91, I-10135 Turin (Italy)

Amorphous Fe{sub 73.9}Nb{sub 3.1}Cu{sub 0.9}Si{sub 13.2}B{sub 8.9} thin films have been produced by ion beam sputtering with two different beam energies (500 and 1000 eV). Magnetic measurements indicate that the samples display a uniaxial magnetic anisotropy, especially for samples prepared with the lower beam energy. Magnetization relaxation has been measured on both films with an alternating gradient force magnetometer and magneto-optical Kerr effect. Magnetization relaxation occurs on time scales of tens of seconds and can be described with a single stretched exponential function. Relaxation intensity turns out to be higher when measured along the easy magnetization axis.

• OSTI ID: 21057505
• Journal Information: Journal of Applied Physics, Vol. 102, Issue 4; Other Information: DOI: 10.1063/1.2775537; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA); ISSN 0021-8979
• Country of Publication: United States
• Language: English

Related Subjects

36 MATERIALS SCIENCE
ANISOTROPY
BORON ALLOYS
COPPER ALLOYS
EV RANGE 100-1000
INTERMETALLIC COMPOUNDS
ION BEAMS
IRON ALLOYS
KERR EFFECT
MAGNETIC PROPERTIES
MAGNETIZATION
MAGNETO-OPTICAL EFFECTS
MAGNETOMETERS
METALLIC GLASSES
NIOBIUM ALLOYS
RELAXATION
SILICON ALLOYS
SPUTTERING
THIN FILMS