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Title: EXAFS Analysis of the Local Structure of GexSi1-x Thin Film Alloys

Abstract

In this work we analyzed the local structure of GexSi1-x (x = 0.5 and 0.8) ultra thin film alloys deposited on silicon substrate. The local structural parameters for the thin films were compared to the values for a bulk sample. The coordination numbers for the thin films were similar to the value of a bulk sample but the interatomic distances were different. Also, the use of a germanium solid state detector was important for EXAFS analysis of ultra thin film alloys.

Authors:
 [1];  [2];  [3]
  1. Beamline Research Division, Pohang Accelerator Laboratory, POSTECH, 790-784 (Korea, Republic of)
  2. Electronic and Telecommunications Research Institute, Daejeon, 305-350 (Korea, Republic of)
  3. Physics Division, School of Science Education, Chungbuk National University, Cheongju, 361-763 (Korea, Republic of)
Publication Date:
OSTI Identifier:
21054683
Resource Type:
Journal Article
Resource Relation:
Journal Name: AIP Conference Proceedings; Journal Volume: 882; Journal Issue: 1; Conference: XAFS13: 13. international conference on X-ray absorption fine structure, Stanford, CA (United States), 9-14 Jul 2006; Other Information: DOI: 10.1063/1.2644594; (c) 2007 American Institute of Physics; Country of input: International Atomic Energy Agency (IAEA)
Country of Publication:
United States
Language:
English
Subject:
36 MATERIALS SCIENCE; ABSORPTION SPECTROSCOPY; CONCENTRATION RATIO; CRYSTAL STRUCTURE; FINE STRUCTURE; GERMANIUM; GERMANIUM ALLOYS; INTERATOMIC DISTANCES; SEMICONDUCTOR MATERIALS; SILICON; SILICON ALLOYS; SOLIDS; SUBSTRATES; THIN FILMS; X-RAY SPECTROSCOPY

Citation Formats

Sung, Narkeon, Yoo, Yong-Goo, and Yang, Dong-Seok. EXAFS Analysis of the Local Structure of GexSi1-x Thin Film Alloys. United States: N. p., 2007. Web. doi:10.1063/1.2644594.
Sung, Narkeon, Yoo, Yong-Goo, & Yang, Dong-Seok. EXAFS Analysis of the Local Structure of GexSi1-x Thin Film Alloys. United States. doi:10.1063/1.2644594.
Sung, Narkeon, Yoo, Yong-Goo, and Yang, Dong-Seok. Fri . "EXAFS Analysis of the Local Structure of GexSi1-x Thin Film Alloys". United States. doi:10.1063/1.2644594.
@article{osti_21054683,
title = {EXAFS Analysis of the Local Structure of GexSi1-x Thin Film Alloys},
author = {Sung, Narkeon and Yoo, Yong-Goo and Yang, Dong-Seok},
abstractNote = {In this work we analyzed the local structure of GexSi1-x (x = 0.5 and 0.8) ultra thin film alloys deposited on silicon substrate. The local structural parameters for the thin films were compared to the values for a bulk sample. The coordination numbers for the thin films were similar to the value of a bulk sample but the interatomic distances were different. Also, the use of a germanium solid state detector was important for EXAFS analysis of ultra thin film alloys.},
doi = {10.1063/1.2644594},
journal = {AIP Conference Proceedings},
number = 1,
volume = 882,
place = {United States},
year = {Fri Feb 02 00:00:00 EST 2007},
month = {Fri Feb 02 00:00:00 EST 2007}
}
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