Local ordering in Ge/Ge–Sn semiconductor alloy core/shell nanowires revealed by extended x-ray absorption fine structure (EXAFS)
- Stanford University, CA (United States); University of Arkansas
- National Institute of Standards and Technology (NIST), Gaithersburg, MD (United States)
- University of Texas at Dallas, Richardson, TX (United States)
- SLAC National Accelerator Laboratory, Menlo Park, CA (United States)
- Stanford University, CA (United States); SLAC National Accelerator Laboratory, Menlo Park, CA (United States)
Short-range atomic order in semiconductor alloys is a relatively unexplored topic that may promote design of new materials with unexpected properties. Here, local atomic ordering is investigated in Ge–Sn alloys, a group-IV system that is attractive for its enhanced optoelectronic properties achievable via a direct gap for Sn concentrations exceeding ≈10 at. %. The substantial misfit strain imposed on Ge–Sn thin films during growth on bulk Si or Ge substrates can induce defect formation; however, misfit strain can be accommodated by growing Ge–Sn alloy films on Ge nanowires, which effectively act as elastically compliant substrates. In this work, Ge core/Ge1–xSnx (x ≈ 0.1) shell nanowires were characterized with extended x-ray absorption fine structure (EXAFS) to elucidate their local atomic environment. Simultaneous fitting of high-quality EXAFS data collected at both the Ge K-edge and the Sn K-edge reveals a large (≈ 40%) deficiency of Sn in the first coordination shell around a Sn atom relative to a random alloy, thereby providing the first direct experimental evidence of significant short-range order in this semiconductor alloy system. Furthermore, comparison of path length data from the EXAFS measurements with density functional theory simulations provides alloy atomic structures consistent with this conclusion.
- Research Organization:
- SLAC National Accelerator Laboratory (SLAC), Menlo Park, CA (United States); University of Arkansas, Fayetteville, AR (United States)
- Sponsoring Organization:
- U.S. National Science Foundation; USDOE Office of Science (SC), Basic Energy Sciences (BES); USDOE Office of Science (SC), Office of Workforce Development for Teachers & Scientists (WDTS)
- Grant/Contract Number:
- AC02-76SF00515; SC0014664; SC0023412
- OSTI ID:
- 1970162
- Alternate ID(s):
- OSTI ID: 1993515
- Journal Information:
- Applied Physics Letters, Journal Name: Applied Physics Letters Journal Issue: 6 Vol. 122; ISSN 0003-6951
- Publisher:
- American Institute of Physics (AIP)Copyright Statement
- Country of Publication:
- United States
- Language:
- English
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Related Subjects
36 MATERIALS SCIENCE
Alloys
C-MOS
Density functional theory
Extended X-ray absorption fine structure
Nanowires
Optoelectronic properties
Scanning electron microscopy
Semiconductors
Thin films
X-ray diffraction
alloys
density functional theory
extended X-ray absorption fine structure
nanowires
optoelectronic properties
scanning electron microscopy
semiconductors
thin films
x-ray diffraction
Alloys
C-MOS
Density functional theory
Extended X-ray absorption fine structure
Nanowires
Optoelectronic properties
Scanning electron microscopy
Semiconductors
Thin films
X-ray diffraction
alloys
density functional theory
extended X-ray absorption fine structure
nanowires
optoelectronic properties
scanning electron microscopy
semiconductors
thin films
x-ray diffraction